GaN(0001(bar)) films were grown by molecular beam epitaxy using ammonia and elemental Ga. The surface reactivity and growth kinetics of GaN(0001(bar)) were investigated as a function of growth parameters using desorption mass spectroscopy. Growth proceeds either by island nucleation or by step flow, depending on the steady state surface coverage of Ga. Three Ga adsorption states were found on the surface, one chemisorption and two weak states. One of the weak states corresponds to Ga adsorbed on a gallided surface, while the other corresponded to an intrinsic physisorption state on a hydrogen-passivated, nitrided surface. An abrupt growth mode transition between excess Ga and excess nitrogen was found as a function of growth parameters. The transition was modeled by rate equations based on growth at step edges and the three types of adsorption states.